Manufactures and sales products capable of dealing with all needs such as Sputtering Targets, CVD materials, Coating deposition materials used sol-gel method and Inorganic compounds.
Additional Installation of a new Vacuum Hot Pressing Machine
We produce sputtering targets utilizing two different methods. One is melting furnace method and the other is sintering method. Those different methods are selected depending upon variety of material characterizations of the sputtering targets. Upon combinations of those methods, Kojundo thus is capable of produce various kind of targets which our customers request. In addition, we are pleased to announce that a vacuum hot pressing machine has been newly introduced into our sintering process stream and that larger sputtering targets in diameter have become available to our customers.
The normal maximum size of our products is 12 inch in diameter. If you need more large products (18 inch in diameter maximum), please feel free to contact us.
■High melting point metallic alloys
Product example ： W alloy, Mo alloy, Cr alloy, Ta alloy, Nb alloy, V alloy, Ti alloy
■Magnetic materials
Product example ： Fe alloy, Co alloy, Ni alloy、 Co-Fe-B, Fe-Pt, Co-Pt, Heusler alloy(Co-Fe-Ga, Co-Mn-Ga, Fe-V-Al etc)
■Mn alloy
Product example ： Pure Mn(2N8〜4N), Mn-Al, Mn-Bi, Mn-Ga, Mn-Ir, Mn-Si etc
■Oxide
Product example ： MgO, La2O3, PZT, PLZT, STO, AZO etc
■Carbite
Product example ： SiC, B4C etc
■Composite materials
Product example ： Granular film materials : Metallic phase + Non-Metallic phase
Metallic phase=Various Pure metals or Metallic alloys, e.g. Fe, Co-Cr-Pt, Fe-Ni, Fe-Pt.
Non-Metallic phase=Various Oxides or Nitrides, e.g. SiO2, Al2O3, MgO
■Other compounds
Product example ： Nitride, Fluoride, Sulfide
We are ready to customize your requirements if you need materials other than those listed above.
2013.2
